- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 12262
10-year publication summary
|
591
|
649
|
665
|
614
|
704
|
1040
|
1146
|
1477
|
1474
|
980
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7925 |
1425 |
| Canon Inc. | 43817 |
839 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48302 |
639 |
| FUJIFILM Corporation | 30514 |
630 |
| Carl Zeiss SMT GmbH | 3332 |
628 |
| Samsung Electronics Co., Ltd. | 157719 |
312 |
| Applied Materials, Inc. | 20375 |
254 |
| Shin-Etsu Chemical Co., Ltd. | 6096 |
193 |
| Tokyo Electron Limited | 13807 |
179 |
| KLA Corporation | 1849 |
178 |
| Kioxia Corporation | 10815 |
172 |
| Samsung SDI Co., Ltd. | 10589 |
156 |
| Boe Technology Group Co., Ltd. | 44029 |
152 |
| Gigaphoton Inc. | 1326 |
125 |
| Samsung Display Co., Ltd. | 38627 |
109 |
| LG Chem, Ltd. | 17921 |
109 |
| Molecular Imprints, Inc. | 231 |
106 |
| Tokyo Ohka Kogyo Co., Ltd. | 1562 |
94 |
| Cymer, LLC | 414 |
84 |
| Nikon Corporation | 7228 |
82 |
| Other owners | 5796 |