- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 10684
10-year publication summary
584
|
580
|
637
|
654
|
607
|
690
|
965
|
1008
|
1438
|
1061
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 7441 |
1076 |
Canon Inc. | 40398 |
747 |
FUJIFILM Corporation | 29586 |
634 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 43400 |
498 |
Carl Zeiss SMT GmbH | 3027 |
426 |
Samsung Electronics Co., Ltd. | 147622 |
244 |
Applied Materials, Inc. | 18892 |
220 |
Kioxia Corporation | 10441 |
165 |
Boe Technology Group Co., Ltd. | 41547 |
151 |
Tokyo Electron Limited | 12899 |
148 |
Samsung SDI Co., Ltd. | 8589 |
131 |
KLA Corporation | 1605 |
126 |
Shin-Etsu Chemical Co., Ltd. | 5687 |
121 |
LG Chem, Ltd. | 17656 |
111 |
Molecular Imprints, Inc. | 263 |
106 |
Samsung Display Co., Ltd. | 35269 |
101 |
Tokyo Ohka Kogyo Co., Ltd. | 1550 |
86 |
Gigaphoton Inc. | 1244 |
85 |
Konica Minolta Medical & Graphic, Inc. | 750 |
79 |
Micron Technology, Inc. | 26210 |
73 |
Other owners | 5356 |