- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 9834
10-year publication summary
591
|
590
|
649
|
663
|
611
|
680
|
892
|
917
|
1415
|
379
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 7247 |
901 |
Canon Inc. | 38847 |
698 |
FUJIFILM Corporation | 29064 |
629 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 41355 |
436 |
Carl Zeiss SMT GmbH | 2878 |
313 |
Applied Materials, Inc. | 18159 |
195 |
Samsung Electronics Co., Ltd. | 141425 |
191 |
Kioxia Corporation | 10239 |
161 |
Boe Technology Group Co., Ltd. | 39982 |
151 |
Samsung SDI Co., Ltd. | 7629 |
126 |
Tokyo Electron Limited | 12298 |
123 |
LG Chem, Ltd. | 17444 |
112 |
Molecular Imprints, Inc. | 272 |
106 |
Shin-Etsu Chemical Co., Ltd. | 5517 |
100 |
Samsung Display Co., Ltd. | 33498 |
98 |
KLA Corporation | 1463 |
96 |
Konica Minolta Medical & Graphic, Inc. | 822 |
89 |
Tokyo Ohka Kogyo Co., Ltd. | 1514 |
73 |
Micron Technology, Inc. | 26041 |
72 |
Illumina, Inc. | 3211 |
65 |
Other owners | 5099 |