- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 10145
10-year publication summary
591
|
590
|
649
|
664
|
611
|
684
|
927
|
954
|
1425
|
618
|
2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
ASML Netherlands B.V. | 7312 |
968 |
Canon Inc. | 39442 |
718 |
FUJIFILM Corporation | 29228 |
633 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 42118 |
461 |
Carl Zeiss SMT GmbH | 2940 |
358 |
Samsung Electronics Co., Ltd. | 144143 |
210 |
Applied Materials, Inc. | 18406 |
200 |
Kioxia Corporation | 10272 |
161 |
Boe Technology Group Co., Ltd. | 40613 |
150 |
Tokyo Electron Limited | 12540 |
132 |
Samsung SDI Co., Ltd. | 8048 |
127 |
LG Chem, Ltd. | 17561 |
112 |
Molecular Imprints, Inc. | 270 |
106 |
Shin-Etsu Chemical Co., Ltd. | 5598 |
105 |
KLA Corporation | 1512 |
105 |
Samsung Display Co., Ltd. | 34230 |
99 |
Konica Minolta Medical & Graphic, Inc. | 799 |
87 |
Tokyo Ohka Kogyo Co., Ltd. | 1538 |
78 |
Micron Technology, Inc. | 26209 |
73 |
Gigaphoton Inc. | 1216 |
69 |
Other owners | 5193 |