- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 11374
10-year publication summary
|
581
|
637
|
654
|
608
|
693
|
1004
|
1078
|
1452
|
1466
|
207
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 7663 |
1231 |
| Canon Inc. | 41672 |
782 |
| FUJIFILM Corporation | 30034 |
626 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 46613 |
580 |
| Carl Zeiss SMT GmbH | 3163 |
512 |
| Samsung Electronics Co., Ltd. | 151485 |
270 |
| Applied Materials, Inc. | 19683 |
239 |
| Kioxia Corporation | 10521 |
166 |
| Tokyo Electron Limited | 13380 |
164 |
| KLA Corporation | 1746 |
153 |
| Boe Technology Group Co., Ltd. | 42489 |
151 |
| Shin-Etsu Chemical Co., Ltd. | 5861 |
149 |
| Samsung SDI Co., Ltd. | 9263 |
141 |
| LG Chem, Ltd. | 17737 |
111 |
| Molecular Imprints, Inc. | 250 |
106 |
| Samsung Display Co., Ltd. | 37252 |
103 |
| Gigaphoton Inc. | 1283 |
101 |
| Tokyo Ohka Kogyo Co., Ltd. | 1550 |
90 |
| Cymer, LLC | 402 |
74 |
| Micron Technology, Inc. | 27165 |
73 |
| Other owners | 5552 |