- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 7/00 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor
Patent holdings for IPC class G03F 7/00
Total number of patents in this class: 12595
10-year publication summary
|
591
|
649
|
665
|
614
|
706
|
1045
|
1154
|
1489
|
1480
|
1320
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| ASML Netherlands B.V. | 8049 |
1521 |
| Canon Inc. | 44585 |
861 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 49440 |
666 |
| Carl Zeiss SMT GmbH | 3380 |
653 |
| FUJIFILM Corporation | 30849 |
629 |
| Samsung Electronics Co., Ltd. | 159755 |
317 |
| Applied Materials, Inc. | 20654 |
260 |
| Shin-Etsu Chemical Co., Ltd. | 6173 |
199 |
| Tokyo Electron Limited | 14026 |
190 |
| KLA Corporation | 1899 |
188 |
| Kioxia Corporation | 11031 |
173 |
| Samsung SDI Co., Ltd. | 11033 |
161 |
| Boe Technology Group Co., Ltd. | 44771 |
151 |
| Gigaphoton Inc. | 1337 |
134 |
| Samsung Display Co., Ltd. | 39307 |
110 |
| LG Chem, Ltd. | 17997 |
109 |
| Molecular Imprints, Inc. | 228 |
106 |
| Tokyo Ohka Kogyo Co., Ltd. | 1558 |
91 |
| Nikon Corporation | 7232 |
87 |
| Cymer, LLC | 419 |
87 |
| Other owners | 5902 |