- All sections
- C - Chemistrymetallurgy
- C23C - Coating metallic materialcoating material with metallic materialsurface treatment of metallic material by diffusion into the surface, by chemical conversion or substitutioncoating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
Patent holdings for IPC class C23C 16/16
Total number of patents in this class: 185
10-year publication summary
|
14
|
9
|
15
|
11
|
9
|
12
|
11
|
19
|
12
|
8
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Tokyo Electron Limited | 13083 |
52 |
| Applied Materials, Inc. | 19173 |
13 |
| Tanaka Kikinzoku Kogyo K.K. | 570 |
13 |
| Entegris, Inc. | 1913 |
12 |
| Merck Patent GmbH | 5758 |
6 |
| Lam Research Corporation | 5354 |
5 |
| Adeka Corporation | 1368 |
5 |
| Gelest, Inc. | 155 |
4 |
| L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude | 3984 |
4 |
| ASM IP Holding B.V. | 2146 |
3 |
| Sigma-Aldrich Co. | 43 |
3 |
| Tokyo Electron America, Inc. | 53 |
3 |
| Versum Materials US, LLC | 654 |
3 |
| Tokyo Electron U.S. Holdings, Inc | 802 |
3 |
| Public Joint Stock Company "severstal" | 12 |
3 |
| Samsung Electronics Co., Ltd. | 148765 |
2 |
| Applied Materials Israel, Ltd. | 618 |
2 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 45590 |
2 |
| Huawei Technologies Co., Ltd. | 115366 |
2 |
| Daikin Industries, Ltd. | 10146 |
2 |
| Other owners | 43 |