- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/22 - Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masksPreparation thereof
Patent holdings for IPC class G03F 1/22
Total number of patents in this class: 687
10-year publication summary
|
55
|
48
|
55
|
83
|
50
|
47
|
56
|
37
|
40
|
44
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48539 |
180 |
| Applied Materials, Inc. | 20459 |
63 |
| Samsung Electronics Co., Ltd. | 158337 |
46 |
| ASML Netherlands B.V. | 7959 |
35 |
| Hoya Corporation | 2691 |
34 |
| Carl Zeiss SMT GmbH | 3345 |
30 |
| Shin-Etsu Chemical Co., Ltd. | 6117 |
27 |
| Agc, Inc. | 5563 |
16 |
| KLA Corporation | 1865 |
12 |
| Intel Corporation | 47069 |
11 |
| Fine Semitech Corp. | 31 |
10 |
| Gigaphoton Inc. | 1328 |
10 |
| KLA-Tencor Corporation | 2518 |
10 |
| Lam Research Corporation | 5652 |
9 |
| International Business Machines Corporation | 62742 |
7 |
| Tokyo Electron Limited | 13854 |
7 |
| ASML Holding N.V. | 487 |
7 |
| GLOBALFOUNDRIES U.S. Inc. | 6384 |
7 |
| Samsung Display Co., Ltd. | 38791 |
6 |
| FUJIFILM Corporation | 30562 |
6 |
| Other owners | 154 |