- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/70 - Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging
Patent holdings for IPC class G03F 1/70
Total number of patents in this class: 734
10-year publication summary
|
46
|
58
|
48
|
64
|
82
|
70
|
88
|
56
|
47
|
22
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48248 |
184 |
| ASML Netherlands B.V. | 7906 |
95 |
| Samsung Electronics Co., Ltd. | 157557 |
61 |
| Synopsys, Inc. | 2718 |
44 |
| D2s, Inc. | 199 |
24 |
| United Microelectronics Corp. | 4492 |
21 |
| Kioxia Corporation | 10805 |
15 |
| Carl Zeiss SMT GmbH | 3328 |
14 |
| International Business Machines Corporation | 62621 |
12 |
| Canon Inc. | 43768 |
11 |
| Applied Materials, Inc. | 20363 |
10 |
| KLA Corporation | 1844 |
10 |
| Siemens Industry Software Inc. | 1835 |
9 |
| Tokyo Electron Limited | 13796 |
8 |
| Intel Corporation | 47102 |
7 |
| Nikon Corporation | 7235 |
7 |
| Lam Research Corporation | 5621 |
7 |
| GLOBALFOUNDRIES U.S. Inc. | 6391 |
7 |
| Google LLC | 44482 |
7 |
| DTS, Inc. | 379 |
6 |
| Other owners | 175 |