- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devicesmaterials therefororiginals thereforapparatus specially adapted therefor
- G03F 1/82 - Auxiliary processes, e.g. cleaning
Patent holdings for IPC class G03F 1/82
Total number of patents in this class: 316
10-year publication summary
|
16
|
26
|
33
|
21
|
28
|
32
|
34
|
28
|
39
|
20
|
| 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 42549 |
83 |
| ASML Netherlands B.V. | 7371 |
26 |
| Applied Materials, Inc. | 18565 |
18 |
| Carl Zeiss SMT GmbH | 2973 |
14 |
| Suss MicroTec Photomask Equipment GmbH & Co. KG | 24 |
14 |
| Shin-Etsu Chemical Co., Ltd. | 5644 |
12 |
| Bruker Nano, Inc. | 337 |
12 |
| Samsung Electronics Co., Ltd. | 145630 |
10 |
| Hoya Corporation | 2745 |
10 |
| Exogenesis Corporation | 70 |
8 |
| Screen Holdings Co., Ltd. | 2804 |
8 |
| International Business Machines Corporation | 61198 |
5 |
| Photronics, Inc. | 43 |
5 |
| Agc, Inc. | 4820 |
5 |
| Tokyo Electron Limited | 12681 |
3 |
| Semes Co., Ltd. | 1509 |
3 |
| Shibaura Mechatronics Corporation | 287 |
3 |
| Gudeng Equipment Co., Ltd. | 23 |
3 |
| Kioxia Corporation | 10285 |
3 |
| SK Enpulse Co., Ltd. | 63 |
3 |
| Other owners | 68 |