- All sections
- H - Electricity
- H01L - Semiconductor devices not covered by class
- H01L 21/32 - Treatment of semiconductor bodies using processes or apparatus not provided for in groups to form insulating layers thereon, e.g. for masking or by using photolithographic techniquesAfter-treatment of these layersSelection of materials for these layers using masks
Patent holdings for IPC class H01L 21/32
Total number of patents in this class: 551
10-year publication summary
|
58
|
54
|
57
|
67
|
44
|
37
|
41
|
33
|
28
|
5
|
| 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | 2026 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 48302 |
91 |
| Applied Materials, Inc. | 20375 |
54 |
| Tokyo Electron Limited | 13807 |
29 |
| International Business Machines Corporation | 62634 |
21 |
| ASM IP Holding B.V. | 2397 |
20 |
| Lam Research Corporation | 5635 |
19 |
| Intel Corporation | 47106 |
17 |
| Micron Technology, Inc. | 27657 |
16 |
| Samsung Electronics Co., Ltd. | 157719 |
11 |
| Texas Instruments Incorporated | 19672 |
9 |
| GLOBALFOUNDRIES U.S. Inc. | 6387 |
9 |
| Adeia Semiconductor Solutions LLC | 760 |
9 |
| United Microelectronics Corp. | 4492 |
7 |
| Commissariat à l'énergie atomique et aux energies alternatives | 11123 |
7 |
| Versum Materials US, LLC | 678 |
7 |
| Tokyo Electron U.S. Holdings, Inc | 901 |
7 |
| Samsung Display Co., Ltd. | 38627 |
6 |
| Semiconductor Manufacturing International (Shanghai) Corporation | 1732 |
6 |
| FUJIFILM Corporation | 30514 |
4 |
| Renesas Electronics Corporation | 5870 |
4 |
| Other owners | 198 |